-
1
-
-
21544461610
-
-
H. Morkoc, S. Strite, G. B. Gao, M. E. Lin, B. Sverdlov, and M. Burns, J. Appl. Phys. 76, 1363 (1994).
-
(1994)
J. Appl. Phys.
, vol.76
, pp. 1363
-
-
Morkoc, H.1
Strite, S.2
Gao, G.B.3
Lin, M.E.4
Sverdlov, B.5
Burns, M.6
-
6
-
-
21544440405
-
-
J. W. Huang, T. F. Kuech, H. Lu, and I. Bhat, Appl. Phys. Lett. 68, 2392 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 2392
-
-
Huang, J.W.1
Kuech, T.F.2
Lu, H.3
Bhat, I.4
-
7
-
-
0032094133
-
-
Y. Zohta, H. Kuroda, R. Nii, and S. Nakamura, J. Cryst. Growth 189/190, 816 (1998).
-
(1998)
J. Cryst. Growth
, vol.189-190
, pp. 816
-
-
Zohta, Y.1
Kuroda, H.2
Nii, R.3
Nakamura, S.4
-
8
-
-
0000765038
-
-
E. Monroy, M. Hamilton, D. Walker, P. Kung, F. J. Sanchez, and M. Razeghi, Appl. Phys. Lett. 74, 1171 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 1171
-
-
Monroy, E.1
Hamilton, M.2
Walker, D.3
Kung, P.4
Sanchez, F.J.5
Razeghi, M.6
-
11
-
-
21544437251
-
-
T. Tanaka, A. Watanabe, H. Amano, Y. Kobayashi, I. Akasaki, S. Yamazaki, and M. Koike, Appl. Phys. Lett. 65, 593 (1994).
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 593
-
-
Tanaka, T.1
Watanabe, A.2
Amano, H.3
Kobayashi, Y.4
Akasaki, I.5
Yamazaki, S.6
Koike, M.7
-
12
-
-
0000300543
-
-
W. Kim, A. E. Botchkarev, A. Salvador, G. Popovidi, H. Tang, and H. Morkoc, J. Appl. Phys. 82, 219 (1997).
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 219
-
-
Kim, W.1
Botchkarev, A.E.2
Salvador, A.3
Popovidi, G.4
Tang, H.5
Morkoc, H.6
-
14
-
-
0030110699
-
-
H. Nakayama, P. Hacke, M. R. H. Khan, T. Detchprohm, T. D. Kazumasa, K. Hiramatsu, and N. Sawaki, Jpn. J. Appl. Phys., Part 2 35, L282 (1996).
-
(1996)
Jpn. J. Appl. Phys.
, vol.35
, Issue.2 PART
-
-
Nakayama, H.1
Hacke, P.2
Khan, M.R.H.3
Detchprohm, T.4
Kazumasa, T.D.5
Hiramatsu, K.6
Sawaki, N.7
-
15
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85037515852
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note
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A p-n junction layer structure is preferable to a Schottky diode for these variable-frequency capacitance measurements because a much lower series resistance can be obtained using the n-GaN layer. As pointed out in Ref. 4, erroneous data may be generated in high-frequency measurements as a result of a large series resistance.
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16
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0032477196
-
-
P. Kozodoy, S. Keller, S. P. DenBaars, and U. K. Mishra, J. Cryst. Growth 195, 265 (1998).
-
(1998)
J. Cryst. Growth
, vol.195
, pp. 265
-
-
Kozodoy, P.1
Keller, S.2
DenBaars, S.P.3
Mishra, U.K.4
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18
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85037506089
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note
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Because the high-frequency capacitance varies from the low-frequency value simply as a result of Δd (which is independent of the dc bias), high-frequency capacitance - voltage measurements cannot be used to extract the hole concentration. This may explain some differences between the present work and that of Ref. 6.
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21
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84950278842
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The simulation program used
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The simulation program used, "ID Poisson" by G. L. Snider, is available through the internet at http://www.nd.edu/~gsnider.
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ID Poisson
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Snider, G.L.1
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