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Journal of Applied Physics

Volumn 75, Issue 10, 1994, Pages 4933-4938

Non-mass-separated ion shower doping of polycrystalline silicon

(2) Mishima, Yasuyoshi a Takei, Michiko a

a FUJITSU LABORATORIES LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001264498 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.355782 Document Type: Article

Times cited : (24)

References (11)

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2
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3
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- in Extended Abstracts of the 22nd Conference on Solid State Devices and Materials, Sendai, 1990
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4
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- Noguchi, T.¹ Hayashi, H.² Ohshima, T.³

6
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- Lindhard, J.¹ Scharff, M.² Schoitt, H.E.³

7
- 0020914176
- (1983) J. Non-Cryst. Solids , vol.59-60 , pp. 161
- Beyer, W.¹ Wagner, H.²

8
- 0004132814
- 2nd ed. (Wiley, New York)
- (1975) Projected Range Statistics and Semiconductors and Related Materials
- Gibbons, J.F.¹ Johnson, W.S.² Mylroie, S.W.³

9
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- (1977) Philos. Mag , vol.35 , pp. 1173
- LeComber, P.G.¹ Jones, D.I.² Spear, W.E.³

10
- 84952267764
- Osaka, (Plenum, New York)
- (1974) Proceedings of the 4th International Conference on Ion Implantation in Semiconductors , pp. 493
- Mitchell, J.B.¹ Namba, S.² Davies, J.A.³ Howe, L.M.⁴ Walker, R.S.⁵ Winterbon, K.B.⁶ Foti, G.⁷ Moore, J.A.⁸

11
- 2142785957
- Garmisch, (Springer, New York)
- (1971) Proceedings of the 2nd International Conference on Ion Implantation in Semiconductors , pp. 85
- Muller, H.¹ Ruge, I.² Graul, J.³ Ryssel, H.⁴ Ruge, I.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.