Power deposition in high-density inductively coupled plasma tools for semiconductor processing

Physics of Plasmas

Volumn 2, Issue 6, 1995, Pages 2597-2604

  Jaeger, E F ^a   Berry, L A ^a   Tolliver, J S ^a   Batchelor, D B ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

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EID: 0001263998     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.871222     Document Type: Article

References (15)