Phase Transition in SnI4 at High Pressure

Review of High Pressure Science and Technology/Koatsuryoku No Kagaku To Gijutsu

Volumn 7, Issue , 1998, Pages 278-280

  Sato, K ^a   Hamaya, N ^a  

^a OCHANOMIZU UNIVERSITY   (Japan)

Author keywords

Amorphous; Molecular dissociation; Phase transition; Rietveld analysis; Synchrotron x ray diffraction

Indexed keywords

EID: 0001258772     PISSN: 0917639X     EISSN: 13481940     Source Type: Journal    
DOI: 10.4131/jshpreview.7.278     Document Type: Article

References (15)

1. B. M. Riggleman and H. G. Drickamer, J. Chem. Phys. 38, 2721 (1963).
2. R. W. Lynch and H. G. Drickamer, J. Chem. Phys. 45, 1020 (1966).
3. Y. Fujii, M. Kowaka and A. Onodera, J. Phys. C. Solid State Phys. 18, 789 (1985).
4. S. Sugai, J. Phys. C: Solid State Phys. 18, 799 (1985).
5. M. Pasternak and R. D. Taylor, Phys. Rev. B37, 8130 (1988).
6. A. L. Chen, P. Y. Yu and M. P. Pasternak, Phys. Rev. B44, 2883 (1991).
7. F. Wang and R. Ingalls, in High Pressure Science and Technology, edited by W. A. Trzeciakowski (World Sci. Publ., Singapore, 1996), p. 289.
8. W. Williamson III and S. A. Lee, Phys. Rev. B44, 9853 (1991).
9. M. P. Pasternak, R. D. Taylor, M. B. Kruger, R. Jeanloz, J. P. Itie and A. Polian, Phys. Rev. Lett. 72, 2733 (1994).
10. M. B. Kruger and C. Meade, Phys. Rev. B55, 1 (1997).
11. H. K. Mao and P. M. Bell, J. W. Shaner and D. J. Steinberg, J. Appll. Phys. 49, 3276 (1978).
12. O. L. Anderson, D. G. Isaak and S. Yamamoto, J. Appll. Phys. 65, 1534 (1989).
13. O. Shimomura, K. Takemura, H. Fujihisa, Y. Fujii, Y. Ohishi, T. Kikegawa, Y. Amemiya and T. Matsushita, Rev. Sci. Instrum. 63, 967 (1992).
14. F. Izumi, The Rietveld Analysis, edited by R. A. Young (Oxford, New York, 1993).
15. R. Reichlin, A. K. McMahan, M. Ross and S. Martin, Phys. Rev. B49, 3725 (1994).