The effect of reactive plasma etching on the transient enhanced diffusion of boron in silicon

Applied Physics Letters

Volumn 71, Issue 13, 1997, Pages 1834-1836

  Privitera, Vittorio ^a   Priolo, Francesco ^b   Mannino, Giovanni ^b   Campisano, Salvatore Ugo ^b   Carnera, Alberto ^c   Arena, Giuseppe ^d   Spinella, Corrado ^a  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

^c UNIVERSITY OF PADOVA   (Italy)

^d STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001245995     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119414     Document Type: Article

References (9)

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