UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films

Applied Organometallic Chemistry

Volumn 13, Issue 9, 1999, Pages 643-647

  Ouchi, Akihiko ^a   Koga, Yoshinori ^a   Bastl, Zdeněk ^b   Pola, Josef ^c  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^c INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

Author keywords

Chemical vapour deposition; Laser photolysis; Polysiloxane films; Trimethyl(vinyloxy)silane

Indexed keywords

EID: 0001239327     PISSN: 02682605     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1099-0739(199909)13:9<643::aid-aoc886>3.0.co;2-%23     Document Type: Article

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