Synthesis of Me2Si-bridged ansa-zirconocenes by amine elimination

Organometallics

Volumn 15, Issue 19, 1996, Pages 4045-4053

  Diamond, Gary M ^a   Jordan, Richard F ^a   Petersen, Jeffrey L ^b  

^a University of Iowa ^*  (United States)

^b WEST VIRGINIA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001235228     PISSN: 02767333     EISSN: None     Source Type: Journal    
DOI: 10.1021/om9601054     Document Type: Article

References (56)

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29. For studies of the influence of Cp substituents and bridge structures on the electrophilicity of zirconocene complexes see: (a) Alameddin, N. G.; Ryan, M. F.; Eyler, J. R.; Siedle, A. R.; Richardson, D. E. Organometallics 1995, 14, 5005. (b) Bajgur, C. S.; Tikkanen, W. R.; Petersen, J. L. Inorg. Chem. 1985, 24, 2539. (c) Woo, T. K.; Fan, L.; Ziegler, T. Organometallics 1994, 13, 2252. (d) Siedle, A. R.; Newmark, R. A.; Lamanna, W. M.; Schroepfer, J. N. Polyhedron 1990, 9, 301. (e) Gassman, P. G.; Deck, P. A.; Winter, C. H.; Dobbs, D. A.; Cao, D. H. Organometallics 1992, 11, 959.
30. For studies of the influence of Cp substituents and bridge structures on the electrophilicity of zirconocene complexes see: (a) Alameddin, N. G.; Ryan, M. F.; Eyler, J. R.; Siedle, A. R.; Richardson, D. E. Organometallics 1995, 14, 5005. (b) Bajgur, C. S.; Tikkanen, W. R.; Petersen, J. L. Inorg. Chem. 1985, 24, 2539. (c) Woo, T. K.; Fan, L.; Ziegler, T. Organometallics 1994, 13, 2252. (d) Siedle, A. R.; Newmark, R. A.; Lamanna, W. M.; Schroepfer, J. N. Polyhedron 1990, 9, 301. (e) Gassman, P. G.; Deck, P. A.; Winter, C. H.; Dobbs, D. A.; Cao, D. H. Organometallics 1992, 11, 959.
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42. 20B) of roc-10.
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45. 2, 2.11 Å; ref 22.
46. 2, 2.11 Å; ref 22.
47. 2, 2.11 Å; ref 22.
48. 2, 2.11 Å; ref 22.
49. 2, 2.11 Å; ref 22.
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51. 2, 2.11 Å; ref 22.
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55. SHELXL-93 is a FORTRAN-77 program (Professor G. Sheldrick, Institut fur Anorganische Chemie, University of Gottingen, D-37077 Gottingen, Germany) for single-crystal X-ray structural analyses. All computations were performed on a Silicon Graphics Iris Indigo workstation.
56. 1/2, where n is the number of reflections and p is the number of parameters varied during the last refinement cycle.