Evaluation of plasma damage using fully processed metal-oxide-semiconductor transistors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 571-576

  Li, Xiao Yu ^a   Brozek, Tomasz ^a   Preuninger, Fred ^b   Chan, David ^c   Viswanathan, Chand R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b SEMATECH   (United States)

^c Rockwell International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001224185     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588433     Document Type: Review

References (15)

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