Surface processes in low pressure chemical vapour deposition

Journal of Crystal Growth

Volumn 52, Issue PART 1, 1981, Pages 199-206

  Hottier, F ^a   Cadoret, R ^a  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001209797     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(81)90194-9     Document Type: Article

References (24)

1. The Kinetics of Silicon Deposition on Silicon by Pyrolysis of Silane
2. Epitaxial Growth of Silicon from the Pyrolysis of Monosilane on Silicon Substrates
3. The Growth of Crystals and the Equilibrium Structure of their Surfaces