Silicide formation by high-temperature reaction of Rh with model SiO2 films

Journal of Chemical Physics

Volumn 109, Issue 6, 1998, Pages 2052-2055

  Labich, S ^a   Kohl, A ^a   Taglauer, E ^a   Knozinger H ^b  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001169461     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.476784     Document Type: Article

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