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Physical Review B

Volumn 51, Issue 8, 1995, Pages 4872-4881

Hydrogen-mediated creation and annihilation of strain in amorphous silicon

(2) Nickel, N H a Jackson, W B a

a PALO ALTO RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001167069 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.51.4872 Document Type: Article

Times cited : (57)

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