Combustion chemical vapor deposition: A novel thin-film deposition technique

Applied Physics Letters

Volumn 63, Issue 2, 1993, Pages 266-268

  Hunt, A T ^a   Carter, W B ^a   Cochran Jr , J K ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001155311     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.110362     Document Type: Article

References (12)