Dynamic study and experimental "two-step process" of substrate step preparation for high-Tc Josephson junctions

Applied Physics Letters

Volumn 76, Issue 10, 2000, Pages 1312-1314

  Zhai, H Y ^a   Zhang, L ^a   Chu, W K ^a   Morishita, T ^b   Tanaka, S ^b   Xu, F Z ^c   Yang, Q S ^c  

^a UNIVERSITY OF HOUSTON   (United States)

^b SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

^c INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001138055     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126019     Document Type: Article

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