The significance of a fluence threshold for ultraviolet laser ablation and etching of polymers

Journal of Applied Physics

Volumn 67, Issue 3, 1990, Pages 1604-1606

  Srinivasan, R ^a   Casey, Kelly G ^a   Braren, Bodil ^a   Yeh, Mildred ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001128478     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.345647     Document Type: Article

References (10)