Photoinduced Opposite Diffusion of Nematic and Isotropie Monomers during Patterned Photopolymerization

Chemistry of Materials

Volumn 10, Issue 1, 1998, Pages 135-145

  Van Nostrum, Cornelus F ^a,d   Nolte, Roeland J M ^a   Broer, Dirk J ^b   Fuhrman, Thomas ^c   Wendorff, Joachim H ^c  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c PHILIPPS UNIVERSITY MARBURG   (Germany)

^d EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001117640     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm970305l     Document Type: Article

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