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Volumn 25, Issue 11, 1996, Pages 1748-1753

Schottky barrier heights on IV-IV compound semiconductors

Author keywords

Schottky barrier height; Si1 x yGexCy; Strain; Tungsten

Indexed keywords


EID: 0001091208     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-996-0030-3     Document Type: Article
Times cited : (16)

References (30)
  • 11
    • 21544441103 scopus 로고
    • W. Kissinger, M. Weidner, H.J. Osten, M. Eichler, Appl. Phys. Lett. 65 3356 (1994); H.J. Osten, W. Kissinger, M. Weidner, M. Eichler, Strained Layer Epitaxy - Materials, Processing and Device Applications, ed. E. Fitzgerald, K.Y.N. Cheng, J. Hoyt, J. Bean, 379 (Pittsburgh, PA: Mater. Res. Soc.,1995), p. 199.
    • (1994) Appl. Phys. Lett. , vol.65 , pp. 3356
    • Kissinger, W.1    Weidner, M.2    Osten, H.J.3    Eichler, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.