Identification and influence of acidity on alkylation of phenol with propylene over ZSM-5

Catalysis Letters

Volumn 76, Issue 3-4, 2001, Pages 219-224

  Wang, Bo ^b   Lee, Chul Wee ^a   Cai, Tian Xi ^b   Park, Sang Eon ^a  

^a Korea Research Institute of Chemical Technology   (South Korea)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

31P MAS NMR; Acidity; H ZSM 5; Isopropylation; NH3 TPD; Phenol

Indexed keywords

EID: 0001090845     PISSN: 1011372X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012378113705     Document Type: Article

References (20)

1. M.M. Wu, US Patent 4391 998 (1983).
2. G.E. Stead and L.B. Young, US Patent 4405 818 (1983).
3. C.D. Chang and S.D. Hellring, US Patent 5 175 375 (1992).
4. S. Velu and C.S. Swamy. Catal. Lett. 40 (1996) 265.
5. S. Sato, K. Koizumi and F. Nozaki, Appl. Catal. A 133 (1995) L7.
6. E. Santacesaria and D. Grasso, Appl. Catal. 64 (1990) 83.
7. E. Santacesaria, M. Diserio, P. Ciambelli, D. Gelosa and S. Carra, Appl. Catal. 64 (1990) 101.
8. K. Zhang, C.H. Huang, H.B. Zhang, S.H. Xiang, S.Y. Liu, D. Xu and H.X. Li, Appl. Catal. A 166 (1998) 89.
9. S. Subramanian, A. Mitra, C.V.V. Satyanarayana and D.K. Chakrabarty, Appl. Catal. A 159 (1997) 229.
10. D. Michel, A. Germanus and H.J. Pfeiler, J. Chem. Soc. Faraday Trans. 79 (1982) 237.
11. J.A. Ripmeester, J. Am. Chem. Soc. 105 (1983) 2925.
12. L. Baltusis, J.S. Frye and G.E. Maciel, J. Am. Chem. Soc. 108 (1986) 7119.
13. W.P. Rothwell, W.X. Shen and J.H. Lunsford, J. Am. Chem. Soc. 106 (1984) 2452.
14. E.F. Rakiewicz, A.W. Peters, R.F. Wormsbecher, K.J. Sutovich and K.T. Mueller, J. Phys. Chem. B 102 (1998) 2890.
15. S.C. Lee, S.W. Lee, K.S. Kim, T.J. Lee, D.H. Kim and J.C. Kim, Catal. Today 44 (1998) 253.
16. R.H. Allen and L.D. Yats, J. Am. Chem. Soc. 83 (1961) 2799.
17. J. Wei, J. Catal. 76 (1982) 433.
18. M. Misono, Y. Nishizaka, M. Kawamoto and H. Kato, Stud. Surf. Sci. Catal. 105 (1997) 1501.
19. J.W. Yoo, C.W. Lee, B. Wang and S.E. Park, Bull. Korean Chem. Soc. 22 (2001) 263.
20. J.W. Yoo, C.W. Lee, B Wang and S.E. Park, Res. Chem. Intermed, accepted for publication.