XPS in-depth profiles of native-oxide/P-doped-Si obtained by chemical etching

Shinku/Journal of the Vacuum Society of Japan

Volumn 40, Issue 3, 1997, Pages 258-261

  Ying, Wen Biao ^a   Mizokawa, Yusuke ^a   Konishi, Akito ^a   Yamamoto, Michiyo ^a   Tanahashi, Katsuto ^a   Kamiura, Yoshitomo ^a   Iida, Makio ^b   Kawamoto, Kazunori ^b   Yang, Wei Yi ^c  

^a Osaka Prefecture University   (Japan)

^b DENSO CORPORATION   (Japan)

^c NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001080581     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.40.258     Document Type: Article

References (3)

1. Y. Mizokawa, W. B. Ying, Y. B. Yu, Y. Kamiura, M. Iada and K. Kawamoto: Appl. Surf. Sci. (1996) (561-565).
2. W. B. Ying, Y. Mizokawa, Y. B. Yu, Y. Kamiura, M. Iida and K. Kawamoto: Appl. Surf. Sci. (1996) (556-560).
3. T. Kimura, M. Hirose and Y. Osaka: J. Appl. Phys. 56 (1984) 932.