Ultrashallow junctions in silicon formed by molecular-beam epitaxy using boron delta doping

Applied Physics Letters

Volumn 77, Issue 16, 2000, Pages 2569-2571

  Thompson, Phillip E ^a   Bennett, Joe ^b  

^a NAVAL RESEARCH LABORATORY   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001065508     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1319189     Document Type: Article

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