Impurity dependence of oxide defects in Czochralski silicon

Journal of Applied Physics

Volumn 80, Issue 12, 1996, Pages 6661-6665

  Itsumi, Manabu ^a   Akiya, Hideo ^a   Tomita, Masato ^a   Ueki, Takemi ^a   Yamawaki, Masataka ^a,b  

^a NTT CORPORATION   (Japan)

^b NTT Advance Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001056803     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363790     Document Type: Article

References (36)

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