Nanocrystallization of amorphous Fe-Si-B alloys using high current density electropulsing

Materials Science and Engineering: A

Volumn 287, Issue 2, 2000, Pages 238-247

  Lai, Z H ^a   Conrad, H ^b   Teng, G Q ^c   Chao, Y S ^c  

^a INTERNATIONAL CENTRE FOR MATERIALS PHYSICS   (China)

^b North Carolina State University   (United States)

^c NORTHEASTERN UNIVERSITY   (China)

Author keywords

Amorphous; Crystallization; Electropulsing; Fe Si B alloys; Magnetic properties; M ssbauer

Indexed keywords

ANNEALING; CRYSTALLIZATION; CURRENT DENSITY; IRON ALLOYS; LOW TEMPERATURE OPERATIONS; MAGNETIC PROPERTIES; METALLOGRAPHIC MICROSTRUCTURE; MOSSBAUER SPECTROSCOPY; NANOTECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS IRON SILICON BORON ALLOYS; FINEMET; HIGH CURRENT DENSITY ELECTROPULSING; METGLAS; NANOCRYSTALLIZATION;

AMORPHOUS ALLOYS;

EID: 0001026993     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(00)00781-4     Document Type: Article

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