Microstructure and giant magnetoresistance of Co-Cu granular films fabricated under the extremely clean sputtering process

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 7004-7006

  Tsunoda, Masakiyo ^a   Okuyama, Kentaro ^a   Ooba, Makoto ^a   Takahashi, Migaku ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000954735     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367625     Document Type: Article

References (5)

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4. J. Q. Xiao, J. S. Jiang, and C. L. Chien, Phys. Rev. Lett. 68, 3749 (1992).
5. K. Okuyama, T. Shimatsu, S. Kuji, and M. Takahashi, IEEE Trans. Magn. 31, 3838 (1995).