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Volumn 4274, Issue , 2001, Pages 432-441
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Debris-reduced laser machining of polymeric waveguides for optoelectronic applications
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Author keywords
Absorption losses; Debris; Excimer; Micromachining; Optoelectronic; Polymers; Waveguides
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DEBRIS;
ELECTRIC LOSSES;
EXCIMER LASERS;
LIGHT TRANSMISSION;
MANUFACTURE;
MICROELECTRONICS;
MICROMACHINING;
OPTICAL MULTILAYERS;
OPTICAL WAVEGUIDES;
POLYMERS;
SURFACE ROUGHNESS;
WAVEGUIDES;
ABSORPTION LOSS;
EXCIMERS;
KRF EXCIMER LASER;
OPTOELECTRONIC;
OPTOELECTRONIC APPLICATIONS;
POLYMER MULTILAYERS;
POLYMERIC WAVEGUIDE;
WHITE-LIGHT INTERFEROMETRY;
PULSED LASERS;
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EID: 0000909099
PISSN: 0277786X
EISSN: 1996756X
Source Type: Conference Proceeding
DOI: 10.1117/12.432537 Document Type: Conference Paper |
Times cited : (5)
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References (6)
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