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Volumn 49, Issue 23, 1994, Pages 16367-16371
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Model for amorphization processes in ion-implanted Si
a
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000904107
PISSN: 01631829
EISSN: None
Source Type: Journal
DOI: 10.1103/PhysRevB.49.16367 Document Type: Article |
Times cited : (38)
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References (26)
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