Electrical characterization of Al/Si ohmic contacts to heavily boron doped polycrystalline diamond films

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2535-2541

  Werner, M ^a,c   Johnston, C ^b   Chalker, P R ^b   Romani, S ^b,d   Buckley Golder, I M ^b  

^a VDI/VDE IT   (Germany)

^b RICARDO UK LTD   (United Kingdom)

^c TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^d UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000869970     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361119     Document Type: Article

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