High-temperature stability of alumina in argon and argon/water-vapor environments

Journal of the American Ceramic Society

Volumn 82, Issue 1, 1999, Pages 245-248

  Tai, Weon Pil ^a,c   Watanabe, Tadahiko ^a   Jacobson, Nathan S ^b,c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NASA GLENN RESEARCH CENTER   (United States)

^c AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000848886     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1999.tb01754.x     Document Type: Article

References (10)

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