Direct observation of dangling bond motion in disordered silicon

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 3, 1998, Pages 1114-1117

  Nickel, N ^a   Schiff, E ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b SYRACUSE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000842669     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.1114     Document Type: Article

References (19)

1. M. H. Brodsky and R. S. Title, Phys. Rev. Lett. 23, 581 (1969).
2. H. Dersch, J. Stuke, and J. Beichler, Appl. Phys. Lett. 38, 456 (1981).
3. P. J. Gaczi and D. Booth, Sol. Energy Mater. 4, 279 (1981).
4. N. M. Johnson, D. K. Biegelsen, and M. D. Moyer, Appl. Phys. Lett. 40, 882 (1982).
5. D. K. Biegelsen et. al Appl. Surf. Sci. 22/23, 879 (1985).
6. T. J. McMahon and Y. Xiao, in Amorphous Silicon Technology—1993, edited by E. A. Schiff, M. J. Thompson, A. Madan, K. Tanaka, and P. G. LeComber, MRS Symposia Proceedings No. 297 (Materials Research Society, Pittsburgh, 1993), p. 213.
7. G. D. Watkins and J. W. Corbett, Phys. Rev. 138, A543 (1965).
8. J. H. Stathis and S. T. Pantelides, Phys. Rev. B 37, 6579 (1988).
9. W. B. Jackson, C. C. Tsai, and R. Thompson, Phys. Rev. Lett. 64, 56 (1990).
10. G. A. N. Connell and J. R. Pawlik, Phys. Rev. B 13, 787 (1976).
11. P. A. Thomas et. al Phys. Rev. B 18, 3059 (1978).
12. J.-K. Lee and E. A. Schiff, Phys. Rev. Lett. 68, 2972 (1992).
13. D. K. Biegelsen and M. Stutzmann, Phys. Rev. B 33, 3006 (1986).
14. D. Haneman, M. F. Chung, and A. Taloni, Phys. Rev. 170, 719 (1968).
15. M. F. Chung and D. Haneman, J. Appl. Phys. 37, 1879 (1966).
16. M. Stutzmann and D. K. Biegelsen, Phys. Rev. B 28, 6256 (1983).
17. S. Zafar and E. A. Schiff, Phys. Rev. B 40, 5235 (1989).
18. N. H. Nickel, N. M. Johnson, and W. B. Jackson, Appl. Phys. Lett. 62, 3285 (1993).
19. C. P. Slichter, Principles of Magnetic Resonance, 3rd ed. (Springer, Berlin, 1990).