Reduction of silicon dioxide by aluminum in metal-oxide-semiconductor structures

Journal of Applied Physics

Volumn 80, Issue 11, 1996, Pages 6505-6509

  Dadabhai, Ferhad ^a   Gaspari, Franco ^a   Zukotynski, Stefan ^a   Bland, Colby ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000825850     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363669     Document Type: Article

References (20)

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