Native Oxide Growth and Organic Impurity Removal on Si Surface with Ozone-Injected Ultrapure Water

Journal of the Electrochemical Society

Volumn 140, Issue 3, 1993, Pages 804-810

  Ohmi, T ^a   Isagawa, T ^a   Kogure, M ^a   Imaoka, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

chemical analysis; lithography; oxidation; ozone; silicon compounds

Indexed keywords

EID: 0000821072     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2056163     Document Type: Article

References (17)

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