Hall mobility minimum of temperature dependence in polycrystalline silicon

Journal of Applied Physics

Volumn 83, Issue 1, 1998, Pages 292-296

  Nussbaumer, H ^a,b   Baumgartner, F P ^a,c   Willeke, G ^a   Bucher, E ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

^b Eurosolare SpA   (Italy)

^c Neu Technikum Buchs   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000803158     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366682     Document Type: Article

References (13)

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