Determination of critical thickness of spin reorientation in metastable magnetic ultrathin films

Applied Physics Letters

Volumn 75, Issue 19, 1999, Pages 2987-2989

  Shen, J ^a   Swan, A K ^a   Wendelken, J F ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000799440     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125210     Document Type: Article

References (20)

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