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Journal of Applied Physics

Volumn 60, Issue 5, 1986, Pages 1634-1639

Boron, phosphorus, and arsenic diffusion in tisi2

(5) Gas, P a Deline, V a Dheurle, F M a Michel, A a Scilla, G a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000790453 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.337252 Document Type: Article

Times cited : (89)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.