Substrate Bias Effect on Diamond Deposition by DC Plasma Jet

Japanese Journal of Applied Physics

Volumn 29, Issue 10, 1990, Pages 2082-2086

  Matsumoto, Seiichiro ^a   Hosoya, Ikuo ^a   Chounan, Takeshi ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Bias effect; Chemical vapor deposition; De arc; De plasma jet; Plasma CVD, diamond film

Indexed keywords

EID: 0000762478     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.29.2082     Document Type: Article

References (8)

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