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Volumn 72, Issue 1, 1992, Pages 291-293
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Electromigration in two-level interconnect structures with Al alloy lines and W studs
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000745086
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.352335 Document Type: Article |
Times cited : (30)
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References (13)
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