Annealing effects on A1 and Al-Si contacts with 3C-SiC

Japanese Journal of Applied Physics

Volumn 25, Issue 7, 1986, Pages L592-L594

  Daimon, Hiroshi ^a   Yamanaka, Mitsugu ^a   Sakuma, Eiichiro ^a   Misawa, Shunji ^a   Yoshida, Sadafumi ^a  

^a NONE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000726787     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.25.L592     Document Type: Article

References (14)

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