Hysteresis loop of planar Hall effect in CoCr films

Journal of Applied Physics

Volumn 85, Issue 8 II B, 1999, Pages 5795-5797

  Wu, J C ^a   Wu, C S ^a   Wu, Te Ho ^b  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

^b NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000726574     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369922     Document Type: Article

References (6)

1. K. Okamoto, J. Appl. Phys. 53, 601 (1982).
2. K. Okamoto, J. Magn. Magn. Mater. 35, 353 (1983).
3. K. Okamoto, IEEE Transl. J. Magn. Jpn. TJMJ-1, 541 (1985).
4. D. G. Stinson, A. C. Palumbo, B. Brandt, and M. Berger, J. Appl. Phys. 61, 3816 (1987).
5. T. W. Ko, K. Rhie, Y. Y. Kim, W. Y. Lim, and P. W. Jang, IEEE Trans. Magn. 33, 3568 (1997).
6. 30 kV of Hitachi S2460N scanning electron microscope (SEM) equipped with a versatile pattern generator was used for the structure fabrication in this study. The writing software, Nanopattern Generator Systems (NPGS), is produced by JC Nabity Lithography Systems, Bozeman, MT 59717.