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Applied Physics Letters

Volumn 54, Issue 25, 1989, Pages 2577-2579

Grain size dependence of electromigration-induced failures in narrow interconnects

(2) Cho, J a Thompson, C V a

a MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000722238 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.101054 Document Type: Article

Times cited : (169)

References (10)

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- Muray, L.P.¹ Rathbun, L.C.² Wolf, E.D.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.