High-resolution determination of the stress in individual interconnect lines and the variation due to electromigration

Journal of Applied Physics

Volumn 78, Issue 3, 1995, Pages 1614-1622

  Ma, Qing ^a   Chiras, S ^a   Clarke, D R ^a   Suo, Z ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000704120     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360255     Document Type: Article

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