Ion implantation for silicon device manufacturing: A vacuum perspective

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1115-1123

  Current, Michael I ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000697516     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580279     Document Type: Article

References (35)

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