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Volumn 67, Issue 5, 1990, Pages 2195-2198
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Density relaxation of silicon dioxide on (100) silicon during thermal annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000696153
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.345563 Document Type: Article |
Times cited : (57)
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References (27)
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