Novel fabrication method of Si nanostructures using atomic force microscope (AFM) field-enhanced oxidation and anisotropic wet chemical etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6679-6682

  Araki, Kiyoshi ^a   Morimoto, Kiyoshi ^a   Morita, Kiyoyuki ^a   Niwa, Masaaki ^a   Hirai, Yoshihiko ^b  

^a PANASONIC CORPORATION   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Alignment; Anisotropic wet chemical etching; Atomic force microscope; Field enhanced oxidation; Nanofabrication; Quantum functional device; Si nanostructure

Indexed keywords

EID: 0000693853     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6679     Document Type: Article

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