New single-component resists based on functional polynorborneneimides by chemical amplification for deep uv lithography

Journal of Photopolymer Science and Technology

Volumn 11, Issue 3, 1998, Pages 405-408

  Lee, Chan Woo ^a   Shin, Jung Han ^a   Kang, Jong Hee ^a   Kim, Jong Man ^a   Han, Dong Keun ^a   Ahn, Kwang Duk ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

Deep uv resists; Norborneneimide polymers; Polymeric photoacid generators; Single component resists

Indexed keywords

EID: 0000689255     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.405     Document Type: Article

References (13)

1. K. -D. Ahn, C. -M. Chung, and D. -I. Koo, Chem. Mater. , 6 (1994) 1452.
2. (a) C. -M. Chung, D. -I. Koo, and K. -D. Ahn, J. Photopolym. Sei. Technol, 7 (1994) 473.
3. (b) C. -M. Chung and K. -D. Ahn, J. Photopolym. Sei. Technol. , 9 (1996) 553.
4. K. -D. Ahn, J. -S. Koo, and C. -M. Chung, J. Polym. Sei. , Polym. Chem. , 34 (1996) 183.
5. S. -T. Kim, J. -B. Kim, M. -H. Jung, and K. -D. Ahn, Polym. Bull. , 39 (1997) 423.
6. S. -T. Kim, J. -B. Kim, J. -M. Kim, C. -M. Chung, and K. -D. Ahn, J. Photopolym. Sei. Technol. , 10(1997)489.
7. J. W. Thackeray et ai. , J. Photopolym Sei. Technol. ,7(1994)619.
8. J. E. Hanson, E. Reichmans, F. M. Houlihan, and T. X. Neenan, Chem. Mater. , 4 (1992) 837.
9. F. M. Houlihan, T. I. Wallow, O. Nalamasu, and E. Reichmanis, Macromolecules, 30 (1997)6517.
10. U. Okoroanganwu, T. Shimokawa, J. Byers, D. Medeiros, C. G. Willson, Q. J. Niu, J. M. -J. Frechet, and R. Allen, Proc. SPIE. , 3049 (1997)92.
11. Q. J. Niu and J. M. J. Frechet, Angew. Chem. Int. £#. ,37(1998)667.
12. H. K. Hall, Jr. and A. B. Padias, Acc. Chem. Res. , 30 (l997) 322. s
13. K. -D. Ahn et al. , J. Photopolym. Sei. Technol. , (1998) to be published.