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Volumn 56, Issue 7, 1986, Pages 769-772

Interstitial hydrogen and neutralization of shallow-donor impurities in single-crystal silicon

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000687859     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.56.769     Document Type: Article
Times cited : (332)

References (32)
  • 16
    • 84927397232 scopus 로고    scopus 로고
    • These are tabulated in the preceding reference with neglect of nuclear-spin degrees of freedom, and so for consistency they are neglected in the solid as well.
  • 18
    • 33749612457 scopus 로고
    • Theoretical study of the atomic structure of silicon (211), (311), and (331) surfaces
    • Phys. Rev. Lett., 41, 1062
    • (1978) Physical Review B , vol.29 , pp. 785
    • Chadi, D.J.1
  • 19
    • 84927397223 scopus 로고    scopus 로고
    • The parameters for Si are given in Ref. 18. The additional Si-H parameters are ES (H) = - 4.15 eV, Vss σ = - 3.46 eV, and Vs p σ = 1.855 eV.
  • 20
    • 84927397221 scopus 로고    scopus 로고
    • It is to be noted that the H—SiH3_ bond energy of 4.09 eV is approximately 0.9 eV larger than the average Si—H bond energy in SiH4_. The tight-binding method accurately predicts this difference.
  • 32
    • 84927397219 scopus 로고    scopus 로고
    • Relaxation of the silicon lattice around the phosphorus dopant was also taken into account.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.