Polyurethane resins as resist materials for excimer ablation lithography(EAL)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2992, Issue , 1997, Pages 129-134

  Hayashi, Nobuaki ^a   Suzuki, Kenkichi ^a   Matsuda, Masaaki ^a   Ogino, Toshio ^a   Tomita, Yoshifumi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Excimer laser; Laser ablation; LCD display; Polyurethane

Indexed keywords

EXCIMER LASERS; LASER ABLATION; LIQUID CRYSTAL DISPLAYS; POLYETHYLENE GLYCOLS; POLYURETHANES; SYNTHETIC RESINS;

CHLOROBENZENE SOLUTION; DIRECT-PATTERNING; EXCIMER ABLATION; LCD DISPLAYS; MOLECULAR DESIGN; PHOTO-DECOMPOSITION; RESIST MATERIALS; TOLUENEDIISOCYANATE;

ABLATION;

EID: 0000674638     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.270090     Document Type: Conference Paper

References (4)

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3. T. F. Deutsch and M. W. Geis, J. Appl. Phys. 54 7201 (1983)
4. K. Suzuki, M. Matsuda, T. Ogino, N. Hayashi, T. Terabayashi and K. Amemiya, SPIE Proceedings 2992-16 (1997)