Fabrication of metal nanowire using carbon nanotube as a mask

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1329-1332

  Yun, Wan Soo ^a,b   Kim, Jinhee ^c   Park, Kang Ho ^a   Ha, Jeong Sook ^a   Ko, Young Jo ^a   Park, Kyoungwan ^a   Kim, Seong Keun ^b   Doh, Yong Joo ^d   Lee, Hu Jong ^d   Salvetat, Jean Paul ^e   Forró, László ^e  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Seoul National University   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

^d Pohang University of Science and Technology (POSTECH)   (South Korea)

^e NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; ELECTRIC INSULATING MATERIALS; GOLD; ION BOMBARDMENT; MASKS; METALLIC FILMS; NANOTUBES; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; SUBSTRATES; TITANIUM;

CARBON NANOTUBES (CNT);

SEMICONDUCTOR QUANTUM WIRES;

EID: 0000670356     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582349     Document Type: Article

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14. This value was calculated from the simple deconvolution of the tip shape, assuming a conical tip with a spherical end, no deformation of the tip and the sample, and the absence of tip tilt during the measurement. The cone angle and the radius of the tip were adopted from the typical values of the commercial tip (Ultra-lever, PSI) and the cross-sectional shape of the sample was obtained from TEM images.
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