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Volumn 64, Issue 5, 1990, Pages 579-582

Evidence that similar point defects cause 1/f noise and radiation-induced-hole trapping in metal-oxide-semiconductor transistors

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EID: 0000655342     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.64.579     Document Type: Article
Times cited : (139)

References (37)
  • 19
    • 84927389763 scopus 로고    scopus 로고
    • For a review of hole traps in SiO2, see F. B. McLean, H. E. Boesch, Jr., and T. R. Oldham, in Ionizing Radiation Effects in MOS Devices and Circuits, edited by T. P. Ma and P. V. Dressendorfer (Wiley, New York, 1989), pp. 87–192.
  • 21
    • 84927389762 scopus 로고    scopus 로고
    • The definition of κg in this reference is q times that in Ref. 9 and the text [Eq. (1)].
  • 24
    • 84927389761 scopus 로고    scopus 로고
    • For a review of Si/SiO2 interface traps, see P. S. Winokur, in Ref. 9, pp. 193–255.
  • 31
    • 84927389760 scopus 로고    scopus 로고
    • A preliminary report describing the noise measurements was presented at the Nuclear and Space Radiation Effects Conference, Marco, FL, July 25-28 1989 [J. H. Schofield, T. P. Doerr, and D. M. Fleetwood, IEEE Trans. Nucl. Sci. (to be published)].
  • 32
    • 84927389759 scopus 로고    scopus 로고
    • For the p-MOS devices, SV= K (Id)2( R0)2( VG - V0)-2f-α , where R0 and V0 are similar, but not equal, to Rchannel and VT, and K is taken from otherwise identical n-MOS transistors on the same wafer [J. H. Scofield, N. Schwadron, and D. M. Fleetwood (unpublished)]. Scaling differences between n- and p-MOS noise have been seen previously (e.g., Ref. 2), and are under study, but do not affect the correlation shown here.
  • 33
    • 84927389758 scopus 로고    scopus 로고
    • D. J. DiMaria, in The Physics of SiO2 and Its Interfaces, edited by S. T. Pantelides (Pergamon, Elmsford, NY, 1978), pp. 160–178.
  • 36
    • 84927389749 scopus 로고    scopus 로고
    • For a review of methods to reduce fOT, see P. V. Dressendorfer, in Ref. 9, pp. 333–400.
  • 37
    • 84927389747 scopus 로고    scopus 로고
    • Here we have simply replaced the areal density of traps that contribute to the noise process in Eq. (1) of Ref. 6 with the equivalent density of traps, (kT/Eg) fOT/ σt, inferred to contribute to the noise process under the assumptions stated in the text. Note that fOT and σt can be measured independently of noise measurements (e.g., Ref. 9). This approach extends and corrects the preliminary model in Ref. 16. The form of Eq. (3) is not significantly affected by the CLS-model presumption that carriers interact with traps via tunneling, while recent evidence (Refs. 2 and 7) favors thermal activation.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.