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Volumn 3333, Issue , 1998, Pages 463-471

Design of an etch-resistant cyclic olefin photoresist

Author keywords

193nm photoresists; Addition polymerization; Cyclic olefin polymers; Etch resistance

Indexed keywords

MONOMERS; OLEFINS; PHOTORESISTORS; PLASMA ETCHING; POLYMERIZATION; POLYMERS; SURFACE TREATMENT;

EID: 0000633472     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312472     Document Type: Conference Paper
Times cited : (16)

References (18)
  • 1
    • 60849121572 scopus 로고    scopus 로고
    • R. D. Allen. W. E. Conley, and R. R. Kunz, Deep-UV Resist Technology, Chp. 4 in Handbook of Microlithography, Ed. P. Rai-Choudhury, SPIE Press, 1997.
    • R. D. Allen. W. E. Conley, and R. R. Kunz, "Deep-UV Resist Technology," Chp. 4 in Handbook of Microlithography, Ed. P. Rai-Choudhury, SPIE Press, 1997.
  • 12
    • 60849108784 scopus 로고    scopus 로고
    • R. Allen, G. Wallraff, W. Hinsberg, L. Simpson, and R. Kunz, ACS Symposium Series 537, Chp. 11, Ed. L. Thompson, G. Willson and S. Tagawa, American Chemical Society, (1994);
    • R. Allen, G. Wallraff, W. Hinsberg, L. Simpson, and R. Kunz, ACS Symposium Series 537, Chp. 11, Ed. L. Thompson, G. Willson and S. Tagawa, American Chemical Society, (1994);
  • 13
    • 84887566721 scopus 로고
    • R. Allen, et al., Proc. SPIE, 1925 246 (1993);
    • (1993) Proc. SPIE , vol.1925 , pp. 246
    • Allen, R.1
  • 16
    • 0029235841 scopus 로고
    • H. Ito, et al., Proc. SPIE, 2438 53 (1995).
    • (1995) Proc. SPIE , vol.2438 , pp. 53
    • Ito, H.1
  • 17
    • 60849129623 scopus 로고    scopus 로고
    • in press
    • T. Wallow, et al., Proc. SPIE, 3333 (1998) in press.
    • (1998) Proc. SPIE , vol.3333
    • Wallow, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.