Microlensarrays fabricated by deep lithography with protons and their characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4455, Issue , 2001, Pages 272-280

  Ottevaere, H ^a   Tuteleers, P ^a   Volckaerts, B ^a   Baukens, V ^a   Lamprecht, J ^b   Schwider, J ^b   Hermanne, A ^a   Naessens, K ^c   Veretennicoff, I ^a   Thienpont, H ^a  

^a VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c GHENT UNIVERSITY   (Belgium)

Author keywords

Characterization; Deep lithography with protons; Interferometry; Refractive microlenses; Replication; Spherical aberration; Vapor diffusion

Indexed keywords

ABERRATIONS; INTERFEROMETRY; LITHOGRAPHY; PHOTORESISTS; PROTONS; REFRACTIVE INDEX; SURFACE PROPERTIES;

DEEP LITHOGRAPHY; MACH-ZEHNDER INTERFEROMETER; PLASTIC MICROLENSLET; SPHERICAL ABERRATIONS; VACUUM CASTING;

MICROLENSES;

EID: 0000629104     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450451     Document Type: Article

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