Mass sensitivity of the thin-rod acoustic wave sensor operated in flexural and extensional modes

Analytical Chemistry

Volumn 68, Issue 15, 1996, Pages 2590-2597

  Li, Paul C H ^a   Thompson, Michael ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000617580     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac960034i     Document Type: Article

References (31)

1. Grate, J. W.; Martin, S. J.; White, R. M. Anal. Chem. 1993, 65, 940A-948A.
2. Grate, J. W.; Martin, S. J.; White, R. M. Anal. Chem. 1993, 65, 987A-996A.
3. Jen, C. K.; Oliveira, J. E. B.; Yu, J. C. H.; Dai, J. D.; Bussière, J. F. Appl. Phys. Lett. 1990, 56, 2183-2185.
4. Li, P. C. H.; Stone, D. C.; Thompson, M. Anal. Chem. 1993, 65, 2177-2180.
5. Li, P. C. H.; Thompson, M. Analyst 1994, 119, 1947-1951.
6. Viens, M.; Li, P. C. H.; Wang, Z.; Jen, C. K.; Thompson, M.; Cheeke, J. D. N. IEEE Trans. Ultrason., Ferroelectr. Freq. Control, in press.
7. Wang, Z.; Cheeke, J. D. N.; Jen, C. K. Electron. Lett. 1990, 26, 1511-1512.
8. Viens, M.; Li, P. C. H.; Wang, Z.; Jen, C. K.; Thompson, M.; Cheeke, J. D. N. IEEE Ultrason. Symp. 1993, 359-364.
9. Ward, M. D.; Delawski, E. J. Anal. Chem. 1991, 63, 886-890.
10. Ostrom, G. S.; Buttry, D. A. J. Electroanal. Chem. 1988, 256, 411-431.
11. Frye, G. C.; Martin, S. J. Appl. Spectrosc. Rev. 1991, 26, 73-149.
12. Mohler, J. B. Electroplating and related processes; Chemical Publishing Co.: New York, 1969.
13. Kuhn, A. T. The Electrochemistry of Lead; Academic Press: New York, 1979.
14. Wenzel, S. W.; White, R. M. IEEE Trans. Electron Devices 1988, 35(6), 735-743.
15. Watkins, R. D.; Cooper, W. H. B.; Gillespie, A. B.; Pike, R. B. Ultrasonics 1982, 20, 257-264.
16. Papadakis, E. P. In Methods of Experimental Physics; Edmonds, P. S., Ed.; Academic Press: New York, 1981; Vol. 19, Chapter 5.
17. Dini, J. W. Electrodeposition: The Material Science of Coatings and Substrates; Noyes Publications: Park Ridge, NJ, 1993.
18. Kochergin, S. M.; Vyaseleva, G. Y. Electrodeposition of metals in ultrasonic fields; Consultants Bureau: New York, 1966.
19. Yeager, E.; Hovorka, F. J. Acoust. Soc. Am. 1953, 25, 443-455.
20. Engan, H. E.; Kim, B. Y.; Blake, J. N.; Shaw, H. J. J. Lightwave Technol. 1988, 6(3), 428-436.
21. Roth, W.; Rich, S. R. J. Appl. Phys. 1953, 24, 940-950.
22. Weil, R. In Properties of electrodeposits-their measurement and significance; Sard, R., Leidheiser, H., Jr., Ogburn, F. Eds.; Electrochemical Society. Pennington, NJ, 1975; Chapter 19.
23. Cheh, H. Y.; Cheng, T. In Proceedings of the Symposium on Electrodeposition Technology; Romankiw, L. T., Turner, D. R., Eds.; Electrochemical Society: Pennington, NJ, 1987; pp 555-564.
24. Vallotton, P. H.; Matlosz, M.; Landolt, D. J. Appl. Electrochem. 1993, 23, 927-932.
25. Miller, J. G.; Bolef, D. I. Rev. Sci. Instrum. 1969, 40, 361-363.
26. Ballantine, D. S., Jr. Anal. Chem. 1992, 64, 3069-3076.
27. Martin, S. J.; Frye, G. C.; Senturia, S. D. Anal. Chem. 1994, 66, 2201.
28. Breazeale, M. A.; Cantrell, J. H., Jr.; Heyman, J. S. In Methods of Experimental Physics; Edmonds, P. S., Ed.; Academic Press: New York, 1981: Vol. 19, Chapter 2.
29. Harrison, R. D. Book of Data; The Nuffield Foundation: London, 1978.
30. Kaye, G. W. C.; Laby, T. H. Tables of Physical and Chemical Constants, 11th ed.; Longmans Green: London, 1957.
31. Brandes, E. A. Smithells Metals Reference Book, 6th ed.; Butterworths: London, 1983.