New method of carbon onion growth by radio-frequency plasma-enhanced chemical vapor deposition

Chemical Physics Letters

Volumn 336, Issue 3-4, 2001, Pages 201-204

  Chen, X H ^a,b   Deng, F M ^b   Wang, J X ^a   Yang, H S ^b   Wu, G T ^b   Zhang, X B ^b   Peng, J C ^a   Li, W Z ^b  

^a HUNAN UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000612162     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(01)00085-9     Document Type: Article

References (11)

1. Kratschmer W., Lamb L.D., Foristopoulos K., Huffman D.R. Nature. 347:1990;354.
2. Ugarte D. Nature. 359:1992;707.
3. De Heer W., Ugarte D. Chem. Phys. Lett. 207:1993;480.
4. Yamada K., Kunishige H., Sawaoka A.B. Naturwissenschaften. 78:1991;450.
5. Hatta N., Murata K. Chem. Phys. Lett. 217:1994;398.
6. Sacco A., Thacker P., Chang T.N., Chiang A.T.S. J. Catal. 85:1984;224.
7. Speck J.S., Endo M., Dresselhaus M.S. J. Cryst. Growth. 93:1989;834.
8. Ivanov V., Nagy J.B., Lambin Ph., Lucas A., Zhang X.B., Zhang X.F. Chem. Phys. Lett. 223:1994;329.
9. Kang Z.C., Wang Z.L. Philos. Mag. B. 73:1996;905.
10. Yamada K., Tobisawa S. Carbon. 27:1989;845.
11. D.E.H. Jones, The Inventions of Daedalus, Freeman, Oxford, 1982, p. 119.